Semiconductor International - Semiconductor Manufacturing News and Technical Information for Semiconductor Engineers and Managers

SI CHINA

SI JAPAN

CURRENT ISSUE

COVER STORY

How Pump-Induced Particles Affect Low-k CMP Defectivity

FEATURES

How Pump-Induced Particles Affect Low-k CMP Defectivity

Fine-Tuning CMP

View Current Issue

FREE subscription

Mapper to Ship E-Beam Lithography System to TSMC
Mapper Lithography (Delft, Netherlands) will ship its first 300 mm multi-column e-beam maskless lithography platform to TSMC for 22 nm process development and device prototyping. “Mapper’s technology holds great promise for cost-effective manufacturing at 22 nm and beyond,” said Jack Sun, vice president of R&D at TSMC.

Qimonda slashes 3,000 jobs, exits 200-mm production, CFO resigns
Jobs will be cut as the struggling DRAM maker attempts to reposition itself by selling off investments and exiting 200-mm manufacturing, ramping down manufacturing in Virginia and in Germany.

Micron pays $400M for Qimonda's Inotera stake, shuffles MeiYa resources
Micron will buy Qimonda's stake in its Nanya DRAM joint venture Inotera Memories. In conjunction with the acquisition, Micron and Nanya plan to cease future resource commitments to MeiYa Technology, a DRAM venture the two companies established in the spring, and redirect those resources to Inotera.

Vishay gives up on proposed IR acquisition
The announcement comes after Vishay's three nominations to IR's board were voted down and concludes a months-long running drama between the two companies that started when IR received an unsolicited $1.6 billion acquisition bid from Vishay.

View All Stories

News from the Web

Universities launch elephantine 78 terabyte digital library
Source: arstechnica.com
Date: 8 minutes ago
Toshiba licenses processor architecture, multiprocessor tools from IMEC
Source: www.eetimes.eu
Date: 15 minutes ago
Olympus-SoC Place-and-Route System Features Parallelism Technology
Source: edageek.com
Date: 37 minutes ago
Low Power RMS Detector, Accurate RF Power Measurement | EDNAsia.com
Source: www.ednasia.com
Date: 1 hour 32 minutes ago

View All Stories

Free Business Purchase Quotes

Compare prices and features for auto dialer software.
Semiconductor International has partnered with BuyerZone to bring you free price quotes on hundreds of products, including auto dialer software and document management solutions.

Wafer Processing NEXX Licenses Alchimer’s Coating Technology Yale’s T.P. Ma Proposes Unipolar CMOS Common Platform Participants Rate High-k as Good Mobile Fit View All Stories	Lithography Mapper Lithography Names Hegarty as CEO Photomask Printability, Standards and Cleaning Remain Concerns De Geus Highlights Photomask Simulation Challenge View All Stories
Yield Management SoftJin Rolls Out Mask Defect Analysis Tool Concentration Sensors Curb Rising CoO Carl Zeiss SMT to Acquire Israeli Start-Up Pixer Technology View All Stories	Inspection, Measurement & Test Photomask Printability, Standards and Cleaning Remain Concerns In-House Manufacturing Remains a Core Competency at Advantest SUSS MicroTec Removes Schneidewind as CEO View All Stories
Clean Processing How Pump-Induced Particles Affect Low-k CMP Defectivity Treating Copper CMP Wastewater Shin-Etsu Polymer Develops Lightweight Resin Frame for Thin Wafers View All Stories	Materials NEXX Licenses Alchimer’s Coating Technology Common Platform Participants Rate High-k as Good Mobile Fit Common Platform Partners Slot HKMG Implementation View All Stories

News from Lexis Nexis

Qimonda Announces Global Restructuring

CFO Michael Majerus to leave Qimonda

Harvard and SiOnyx to Commercialize Black Silicon for Photonics

Blogs
Talkback
Podcast
Video

Views on News
David Lammers, News Editor, Semiconductor International
October 6, 2008
IBM And The All-In Bet on High-K
The debate about the worthiness of high-k/metal gate technology brought to mind what ...
More

Perspectives From the Leading Edge
Philip Garrou, Consultant,
October 5, 2008
3D IC Questions and Answers with the EMC-3D Consortium
Many of you have seen the recent press release by the EMC-3D consortium that ...
More

FLOAT ZONE
Laura Peters, Editor-in-Chief, Semiconductor International
September 26, 2008
Halla’s Perfect Storm of Technology Neglect
Back in 2005, I sat in on a great keynote speech by Brian Halla, CEO and President of...
More

THE MEASURE OF ALL THINGS
Alexander E. Braun, Senior Editor, Semiconductor International
September 16, 2008
The Nanotech Mirage--A Differing View
I received the comments below from Dr. Adolfo Gutierrez, director of uBricks Research...
More

View All Blogs

As k1 scales toward 0.25 and below, the defect printability becomes less likely, unle...
guest - 10/11/2008 7:29:33 PM PT
in response to Photomask Printability, Standards and Cleaning Are Still a Concern

Well, what the article does not mention is the Vbg voltage, which, I assume, plays ma...
Heikki Paananen - 10/9/2008 11:23:57 PM PT
in response to Yale's T.P. Ma Proposes Unipolar CMOS

If you look closely at the figure shown in the article, you will realize that, when t...
T.P. Ma - 10/9/2008 12:56:33 PM PT
in response to Yale's T.P. Ma Proposes Unipolar CMOS

The one (major) thing missing from both the article and the audio interview was "how ...
David Craven - 10/9/2008 3:54:45 AM PT
in response to Yale's T.P. Ma Proposes Unipolar CMOS

» VIEW ALL TALKBACK THREADS

Professor Describes Unipolar CMOS Proposal

Yale Professor T.P. Ma has come up with a replacement for conventional CMOS that would use electrons as the carriers for both channels. Called Unipolar CMOS, the concept has been simulated, and Ma, who won the IEEE Andrew Grove Award in 2005, told News Editor David Lammers it will be faster, denser and less power hungry than today's CMOS.

» VIEW ALL PODCASTS

Now Playing: Crucial Issues for Device Manufacturers
Ludo Deferm, Executive VP, Business Development, IMEC discusses the crucial issues for device manufacturers today: double patterning lithography, high-k/metal gate integration, and how to make these advances cost-effective.